Jacek Stanisławski1, Jerzy Piekoszewski1,2, Edgar Richter3, Zbigniew Werner1
1The Andrzej Soltan Institute for Nuclear Studies (IPJ), 05-400 Otwock-Swierk, Poland,
2Institute of Nuclear Chemistry and Technology, 16 Dorodna Str., 03-195 Warsaw, Poland,
3Institut fur Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf, Postfach 51 01 19, Dresden, Germany
A hybrid type of apparatus is described which enables one to form a thin multi-layer film on the surface of any kind of solid substrate. In one process, the surface is treated with a high intensity pulse plasma beam which introduces the chosen kind of atoms into the near-surface layer of the substrate. In the second process, following the first without breaking the vacuum, the coating is formed by arc PVD (physical vapour deposition) process. Two examples of coatings formed on metallic and ceramic substrates are presented.