LASER INDUCED DIFFUSION IN Ge/Sb-Si FILMS

W. Szyszko

Institute of Physics, Maria Curie-Sklodowska University, Pl. M. Curie-Sklodowskiej 1, 20-031 Lublin, Poland


Melting and solidification of the Ge-Sb multilayer system evaporated onto Si induced by the UV pulsed laser beam are studied together with the diffusion mass transfer. The chemical composition, determined from the numerical simulation of the heat and mass transfer based on Finite Element Method, is compared to the experimental results. The interference effect of the laser beam was also included into the mathematical model of the laser beam interaction with the irradiated target.