SURFACE MODIFICATION OF MATERIALS BY PULSED ION BEAMS

J. Piekoszewski1, J. Langner1, L. Waliś2, Z. Werner1, C. Pochrybniak1, K. Czaus1, A Ciurapiński2, J. Białoskórski1

1 Soltan Institute for Nuclear Studies, 05-400 Otwock-Świerk, Poland,
2 Institute of Nuclear Chemistry and Technology, 03-195 Warsaw, Dorodna 16, Poland

The paper presents the physical and experimental background of the methods of modification of the surface properties of materials using intense ion pulses. The equipment for the generation of such pulses is described. The results of investigations on various applications of ion pulses in material science are summarized. They include doping of semiconductors and metals, formation of metallic layers on various substrates, alloying of contact layers in semiconductors, annealing of post-implantation defects in silicon and melt glazing of ceramics.